HSINCHU, TAIWAN & MOUNTAIN VIEW, USA: United Microelectronics Corp. (UMC), a leading global semiconductor foundry, and Synopsys Inc., announced an expanded collaboration to develop DesignWare IP for UMC's 28-nanometer (nm) HLP Poly SiON process. Extending its previous successes in UMC's 40-nm and 55-nm processes, Synopsys plans to implement its proven DesignWare Embedded Memories and Logic
Wednesday, October 12, 2011
Subscribe to:
Post Comments (Atom)
0 komentar:
Post a Comment